| Course Contents |
| Plasma processes for semiconductors, plasma electromagnetics and circuit models, plasma models, plasma chemistry, plazma etching, transport at long mean free path, evolution of the trench, physical description of the plasma |
| Weekly Course Content |
| Week |
Subject |
Learning Activities and Teaching Methods |
| 1 |
Plasma processes for semiconductors,, plasmas, plasma interactions with materials, plasma electrostatics, transport of particles and energy. |
Explanation, solve problems and answer questions |
| 2 |
Gas phase collisions, a simple random walk, random walks of electrons in a low-pressure plasma, particle flux, feedback in plasmas |
Explanation, solve problems and answer questions |
| 3 |
Plasma electromagnetics and circuit models, negative feedback in the primary circuit, capacitive dis-charge, electron cyclotron resonanse discharge. |
Explanation, solve problems and answer questions |
| 4 |
Plasma models, capacitive rf discharge, local heating in capacitive discharge, nonlocal heating in capacitive discharge. |
Explanation, solve problems and answer questions |
| 5 |
Diffusion in energy, transport and the plasma density profile, the electron distribution function, electron distribution function depemding on total energy. |
Explanation, solve problems and answer questions |
| 6 |
Excitation and ionization rates, higher pressure discharges, particle motion, collisions, wall losses, heating mechanisms. |
Explanation, solve problems and answer questions |
| 7 |
Plasma etching damage, plasma chemistry, rates of reaction, types of reaction, etching recipes, reaktive sputtering |
Explanation, solve problems and answer questions |
| 8 |
mid-term exam |
|
| 9 |
The gas mixture in a plasma, processes in the CF4 plasma |
Explanation, solve problems and answer questions |
| 10 |
Chemistry at long mean free path,, rates for CF4, rates at surface, ion beahavior near the surface and evolution of surface features, neutral particle kinetics at surfaces |
Explanation, solve problems and answer questions |
| 11 |
Evolution of the trench, etching by neutrals, computation of the surface shape, the evolution of a trench with ion-assisted chemical etching. |
Explanation, solve problems and answer questions |
| 12 |
Charging of the trench walls, electron and ion fluxes, trench electrostatics, ion motion in the trench. |
Explanation, solve problems and answer questions |
| 13 |
Physical description of the plasma, analytic plasma models, 1D diffusion, step source, 2D diffusion with “simple” sources. |
Explanation, solve problems and answer questions |
| 14 |
The plasma interior, two-dimensional transport, experimental design, measurements of plasma properties. |
Explanation, solve problems and answer questions |
| 15 |
Computational models of plasma, fluid models, Monte Carlo simulation of plasma, feedback in a plasma simulasion |
Explanation, solve problems and answer questions |
| 16 |
final exam |
|
| Recommend Course Book / Supplementary Book/Reading |
| 1 |
Plasma Processes for Semiconductor Fabrication: W.N. Hitchon (Cambridge University Press) 1999 |
| 2 |
Plasma Charging Damage, Kin P. Cheung (Springer-Verlag London Limited) 2001 |
| 3 |
Development in atomic plasma spectrochemical analyses, Barmes R.M. (Heyden, San Juan) 1980 |
| Required Course instruments and materials |
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